I-Wholesale AlTa Sputtering Target High Purity Thin Film PVD Coating Umkhiqizi Nomphakeli Owenziwe Ngokwezifiso |Ucebile

I-Aluminium-Tantalum

I-AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made Featured Image

Incazelo emfushane:

Isigaba	I-Alloy Sputtering Target
I-Chemical Formula	I-AlTa
Ukwakheka	I-Aluminium-Tantalum
Ubumsulwa	99.9%, 99.95%, 99.99%
Isimo	Amapuleti, Okuqondiwe Kwekholomu, ama-arc cathodes, enziwe ngokwezifiso
Inqubo Yokukhiqiza	Ukuncibilika kweVacuum, PM
Usayizi Otholakalayo	L≤200mm, W≤200mm

Thumela i-imeyili kithi

Imininingwane Yomkhiqizo

Omaka bomkhiqizo

Okuhlosiwe kulungiswa ngokuhlanganisa i-Aluminium ne-Tantalum powders noma ukuncibilika kwe-vacuum okulandelwa ukuminyana ukuze kube ukuminyana okugcwele.Izinto ezihlanganisiwe ngaleyo ndlela zikhethwa ngokuzikhethela bese zibunjwa zibe yisimo esidingekayo.

Ithagethi ye-Aluminium Tantalum sputtering inokuhlanzeka okuphezulu, i-homogeneous microstructure kanye nokusebenza okuhle kakhulu.Isetshenziswa kabanzi ekwakhiweni kwamafilimu amancanyana embonini yokubonisa iphaneli eyisicaba.I-Aluminium Tantalum ingase yengezwe ukuze kukhiqizwe ukusebenza okuphezulu kwe-Titanium alloy ukuze kuthuthukiswe ukufaneleka kwayo kwezinga lokushisa eliphezulu.

Okuqukethwe ukungcola kwe-Al-Ta alloy

ukwakheka	Okuqukethwe(%）
	Ta	Fe	Si	C	O
I-AlTa60	55.0~65.0	≤0.05	≤0.02	≤0.01	≤0.05
I-AlTa70	65.0~75.0	≤0.05	≤0.02	≤0.01	≤0.05

I-Rich Special Materials igxile Ekwenziweni Kwethagethi Ye-Sputtering futhi ingakhiqiza Izinto Ezisetshenziswayo Zokuqhumisa ze-Aluminium Tantalum ngokuya ngokucaciswa kweKhasimende.Imikhiqizo yethu ifaka izici ezinhle kakhulu zemishini, ukwakheka okulinganayo, indawo epholishiwe ngaphandle kokuhlukaniswa, izimbotshana noma imifantu.Ukuze uthole ulwazi olwengeziwe, sicela usithinte.

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