I-CoFeV Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

I-Cobalt Iron Vanadium sputtering target inokuqukethwe okungu-52% kwe-Cobalt, u-9% -23% we-Vanadium kanye nokunye - okune-ductile permanent-magnetic material.Ibonisa umthamo omuhle kakhulu wokuguqulwa kwepulasitiki futhi ingakhiwa ibe izingxenye ezinamafomu ayinkimbinkimbi.

Ithagethi ye-Cobalt Iron Vanadium alloy sputtering ine-saturation flux density Bs ephezulu kakhulu(2.4T) kanye nezinga lokushisa le-Curie(980~1100℃).Ingasiza ekwehliseni isisindo futhi ingathuthukisa ukuzinza emazingeni okushisa aphakeme.Kuyimpahla efanelekile yezinto zikagesi zendiza (imishini emincane kagesi ekhethekile, uzibuthe kagesi kanye nokudluliselwa kukagesi).Iphinde ibe ne-high saturation magnetostriction coefficient, futhi ingakhiqiza i-magnetostrictive transducer.

I-Rich Special Materials igxile Ekwenziweni Kwethagethi Ye-Sputtering futhi ingakhiqiza i-Cobalt Iron Vanadium Sputtering Materials ngokuya ngokucaciswa kweKhasimende.Ukuze uthole ulwazi olwengeziwe, sicela usithinte.