Muva nje, abasebenzisi abaningi baye babuza mayelana nezinzuzo kanye nokubi kobuchwepheshe be-sputtering coating, Ngokwezidingo zamakhasimende ethu, manje ochwepheshe boMnyango Wezobuchwepheshe we-RSM bazohlanganyela nathi, ngethemba lokuxazulula izinkinga.Cishe kukhona amaphuzu alandelayo:
1. Ukufafaza kwe-magnetron okungalingani
Uma sicabanga ukuthi i-flux kazibuthe edlula emaphethelweni kazibuthe angaphakathi nangaphandle we-magnetron sputtering cathode ayilingani, iyi-cathode ye-magnetron sputtering engalingani.Inkambu kazibuthe ye-cathode ye-magnetron sputtering evamile igxiliswe eduze kwendawo okuqondiwe kuyo, kuyilapho insimu kazibuthe ye-magnetron sputtering cathode engalingani iphuma kulokho okuhlosiwe.Indawo kazibuthe ye-cathode yamagnetic evamile ikhawulela ngokuqinile i-plasma eduze nendawo okuhlosiwe, kuyilapho i-plasma eseduze ne-substrate ibuthakathaka kakhulu, futhi i-substrate ngeke ihlaselwe ama-ion nama-electron aqinile.I-non-equilibrium magnetron cathode magnetic field inganweba i-plasma kude nendawo okuhlosiwe futhi icwilise i-substrate.
2. I-Radio frequency (RF) sputtering
Umgomo wokufaka ifilimu ye-insulating: amandla angalungile asetshenziswa kumqhubi obekwe ngemuva kwethagethi ye-insulating.Ku-plasma yokukhishwa okukhanyayo, lapho ipuleti lomhlahlandlela we-ion likhuphuka ngesivinini, liqhumisa ithagethi le-insulating elingaphambi kwalo ukuze liphalaze.Lokhu kuqhuma kungathatha imizuzwana engu-10-7 kuphela.Ngemva kwalokho, amandla amahle akhiwa ukushajwa okuhle okuqoqwe kuthagethi ye-insulating isusa amandla angalungile epuleti lomqhubi, ngakho-ke ukuqhuma kwamabhomu ama-ion anamandla aphezulu endaweni ehlosiwe yokuvikela kuyamiswa.Ngalesi sikhathi, uma i-polarity yokunikezwa kwamandla ihlehliswa, ama-electron azoqhumisa ipuleti le-insulating futhi anciphise ukushajwa okuhle kwepuleti le-insulating phakathi kwamasekhondi angu-10-9, enze uziro wawo onamandla.Ngalesi sikhathi, ukubuyisela emuva i-polarity kagesi kungakhiqiza i-sputtering imizuzwana engu-10-7.
Ubuhle be-RF sputtering: kokubili okuqondiwe kwensimbi kanye nethagethi ye-dielectric kungaqhunyiswa.
3, DC magnetron sputtering
Imishini yokuhlanganisa i-magnetron sputtering yandisa insimu kazibuthe ku-DC sputtering cathode target, isebenzisa amandla e-Lorentz of the magnetic field ukubopha nokwelula i-trajectory yama-electron endaweni kagesi, yandisa ithuba lokushayisana phakathi kwama-electron nama-athomu egesi, yandisa amandla izinga le-ionization lama-athomu egesi, lenyusa inani lama-ion anamandla amakhulu aqhuma impoqo futhi lehlise inani lama-electron anamandla amakhulu aqhuma i-substrate egcwele.
Izinzuzo ze-planar magnetron sputtering:
1. Ukuminyana kwamandla okuhlosiwe kungafinyelela ku-12w/cm2;
2. I-voltage eqondiwe ingafinyelela ku-600V;
3. Umfutho wegesi ungafinyelela ku-0.5pa.
Ukungalungi kwe-planar magnetron sputtering: okuhlosiwe kwakha ishaneli yokufafaza endaweni ye-runway, ukucwiliswa kwendawo yonke okuhlosiwe ayilingani, futhi izinga lokusebenzisa okuhlosiwe lingama-20% - 30 kuphela.
4. Imvamisa emaphakathi ye-AC magnetron sputtering
Isho ukuthi kumshini wokuphalaza we-AC uzibuthe we-AC, ngokuvamile okuqondiwe okubili okunosayizi ofanayo nomumo kumiswa ngakunye, okuvame ukubizwa ngokuthi amathagethi angamawele.Ziwukufakwa okumisiwe.Ngokuvamile, amathagethi amabili anikwa amandla ngesikhathi esisodwa.Enqubweni ye-medium frequency AC magnetron reactive sputtering, lezi zinhloso ezimbili zisebenza njenge-anode ne-cathode ngokushintshana, futhi zisebenza njenge-anode cathode komunye nomunye emjikelezweni ofanayo.Uma ithagethi isemandleni omjikelezo wengxenye engalungile, indawo okuqondiwe kuyo ibhomulwa futhi ikhishwe ama-ion aqondile;Emjikelezweni wesigamu esihle, ama-electron e-plasma asheshiselwa endaweni okuhlosiwe ukuze anciphise ukushaja okuhle okuqoqwe endaweni evikelayo yendawo okuhlosiwe, engacindezeli nje ukuthungela kwendawo okuhlosiwe, kodwa futhi eqeda umcimbi " ukunyamalala kwe-anode."
Izinzuzo ze-intermediate frequency double target reactive sputtering yilezi:
(1) Izinga eliphezulu lokubeka imali.Eziqondisweni ze-silicon, izinga lokubeka le-medium frequency reactive sputtering liphindwe izikhathi ezingu-10 kune-DC reactive sputtering;
(2) Inqubo ye-sputtering ingaqiniswa endaweni yokusebenza emisiwe;
(3) Isenzo "sokuthungela" siyaqedwa.Ukuminyana kwesici sefilimu eyisivikelo esilungisiwe kuyimiyalo eminingana yobukhulu obungaphansi kwaleyo yendlela ye-DC reactive sputtering;
(4) Ukushisa okuphezulu kwe-substrate kunenzuzo ukuthuthukisa ikhwalithi nokunamathela kwefilimu;
(5) Uma ukunikezwa kwamandla kulula ukufanisa okuhlosiwe kunokunikezwa kwamandla e-RF.
5. Ukuphalaza kwe-magnetron esebenzayo
Enqubweni ye-sputtering, igesi yokusabela inikezwa ukuze isabele ngezinhlayiya eziphahliwe ukuze kukhiqizwe amafilimu ayinhlanganisela.Inganikeza igesi esebenzayo ukuze isabele ngethagethi ehlanganisiwe e-sputtering ngesikhathi esifanayo, futhi ingase futhi inikeze igesi esebenzayo ukuze isabele nge-sputtering metal noma i-alloy target ngesikhathi esifanayo ukuze kulungiswe amafilimu ayinhlanganisela anesilinganiso samakhemikhali esinikeziwe.
Izinzuzo zamafilimu ahlanganisiwe we-magnetron sputtering:
(1) Izinto ezihlosiwe kanye namagesi okusabela asetshenziswayo umoya-mpilo, i-nitrogen, ama-hydrocarbon, njll., okuvamise ukuba lula ukuthola imikhiqizo ehlanzekile, ehambisana nokulungiswa kwamafilimu ayinhlanganisela anobumsulwa obuphezulu;
(2) Ngokulungisa imingcele yenqubo, amafilimu ahlanganisiwe amakhemikhali noma angewona amakhemikhali angalungiswa, ukuze izici zamafilimu zilungiswe;
(3) Izinga lokushisa le-substrate aliphezulu, futhi kunemikhawulo embalwa ku-substrate;
(4) Ilungele ukumbozwa komfaniswano wendawo enkulu futhi ibona ukukhiqizwa kwezimboni.
Enqubweni ye-reactive magnetron sputtering, ukungazinzi kwe-compound sputtering kulula ukwenzeka, ikakhulukazi okuhlanganisa:
(1) Kunzima ukulungisa okuhlosiwe okuhlanganisiwe;
(2) Ukwenzeka kwe-arc striking (ukukhishwa kwe-arc) okubangelwa ubuthi obuqondiwe kanye nokungazinzi kwenqubo yokufafaza;
(3) Izinga lokubeka ama-sputtering eliphansi;
(4) Ubuningi besici befilimu buphezulu.
Isikhathi sokuthumela: Jul-21-2022