Njengoba sonke sazi, ukuhwamuka kwe-vacuum kanye ne-ion sputtering kuvame ukusetshenziswa ekufakweni kwe-vacuum.Uyini umehluko phakathi kwe-evaporation coating kanye ne-sputtering coating?Okulandelayo, ochwepheshe bezobuchwepheshe abavela ku-RSM bazokwabelana nathi.
I-vacuum evaporation coating iwukushisa into ezohwamuka iye ezingeni lokushisa elithile ngokushisisa ukumelana noma ugongolo lwe-electron kanye ne-laser bombardment endaweni ene-vacuum degree engekho ngaphansi kuka-10-2Pa, ukuze amandla okudlidliza ashisayo ama-molecule noma ama-athomu kundaba adlula amandla abophayo angaphezulu, ukuze inani elikhulu lama-molecule noma ama-athomu ahwamuke noma anciphe, futhi awele ngokuqondile ku-substrate ukuze akhe ifilimu.I-ion sputtering coating isebenzisa ukunyakaza kwejubane eliphezulu kwama-ion aqondile akhiqizwe ukuchithwa kwegesi ngaphansi kwesenzo senkundla kagesi ukuze kuqhunyiswe ithagethi njenge-cathode, ukuze ama-athomu noma ama-molecule asendaweni eqondiwe abaleke futhi awele phezulu kwendawo yokusebenza epuletiwe ukuze akheke. ifilimu edingekayo.
Indlela evame ukusetshenziswa kakhulu ye-vacuum evaporation coating ukushisa ukumelana, okunezinzuzo zesakhiwo esilula, izindleko eziphansi nokusebenza okulula;Ububi ukuthi ayifanele izinsimbi eziphikisayo kanye nezinto ze-dielectric eziphikisana nokushisa okuphezulu.Ukushisa kwe-electron beam kanye nokushisa kwe-laser kunganqoba ukushiyeka kokushisa kokumelana.Ekushisiseni kwe-electron beam, i-focused electron beam isetshenziselwa ukushisa ngokuqondile into eqhunyiswayo, futhi amandla e-kinetic we-electron beam aba amandla okushisa, okwenza into ihwamuke.Ukushisisa nge-laser kusebenzisa i-laser enamandla amakhulu njengomthombo wokushisisa, kodwa ngenxa yezindleko eziphezulu ze-laser enamandla amakhulu, kungasetshenziswa kuphela kumalabhorethri ambalwa ocwaningo okwamanje.
Ubuchwepheshe be-sputtering buhlukile kubuchwepheshe be-vacuum evaporation.“I-Sputtering” ibhekisela esenzakalweni lapho izinhlayiya ezishajiwe ziqhumisa indawo eqinile (okuqondiwe) futhi zenze ama-athomu aqinile noma ama-molecule adubula phezulu.Iningi lezinhlayiya ezikhishiwe zisesimweni se-athomu, esivame ukubizwa ngokuthi ama-athomu ahlakazekile.Izinhlayiya ezinama-sputtered ezisetshenziselwa ukubhomba okuqondiwe kungaba ama-electron, ama-ion noma izinhlayiya ezingathathi hlangothi.Ngenxa yokuthi ama-ion kulula ukusheshisa ngaphansi kwendawo kagesi ukuze athole amandla e-kinetic adingekayo, iningi lawo lisebenzisa ama-ion njengezinhlayiya eziqhumayo.Inqubo ye-sputtering isekelwe ekuphumeni okukhanyayo, okungukuthi, ama-ion sputtering avela ekukhishweni kwegesi.Ubuchwepheshe obuhlukene bokukhipha amanzi busebenzisa izindlela ezihlukene zokukhipha ukukhanya.I-DC diode sputtering isebenzisa ukukhishwa kokukhanya kwe-DC;I-Triode sputtering wukuphuma okukhanyayo okusekelwa i-cathode eshisayo;I-RF sputtering isebenzisa ukukhishwa kokukhanya kwe-RF;I-Magnetron sputtering iwukukhipha okukhanyayo okulawulwa yi-annular magnetic field.
Uma kuqhathaniswa ne-vacuum evaporation coating, i-sputtering coating inezinzuzo eziningi.Isibonelo, noma iyiphi into ingafafazwa, ikakhulukazi izakhi nezinhlanganisela ezinephuzu eliphezulu lokuncibilika kanye nomfutho womoya ophansi;Ukunamathela phakathi kwefilimu ene-sputtered ne-substrate kuhle;Ukuminyana kwefilimu ephezulu;Ubukhulu befilimu bungalawulwa futhi ukuphindaphinda kuhle.Ububi ukuthi okokusebenza kuyinkimbinkimbi futhi kudinga amadivaysi anamandla kagesi.
Ngaphezu kwalokho, inhlanganisela yendlela yokuhwamuka kanye nendlela yokufafaza i-ion plating.Izinzuzo zale ndlela ukuthi ifilimu etholiwe inokunamathela okuqinile ne-substrate, izinga eliphezulu lokubeka kanye nokuphakama kwefilimu.
Isikhathi sokuthumela: Jul-20-2022