Njengoba sonke sazi, izindlela ezivame ukusetshenziswa ekufakweni kwe-vacuum i-vacuum transpiration kanye ne-ion sputtering.Uyini umehluko phakathi kwe-transpiration coating kanye ne-sputtering coating Abaningiabantu nemibuzo enjalo.Ake sabelane nawe umehluko phakathi kwe-transpiration coating kanye ne-sputtering coating
Ifilimu ye-vacuum transpiration iwukushisa idatha ukuze ifinyelele ezingeni lokushisa elimisiwe ngokushisisa okungaguquki noma ugongolo lwe-electron kanye ne-laser shelling endaweni ene-vacuum degree engekho ngaphansi kuka-10-2Pa, ukuze amandla okudlidliza ashisayo ama-molecule noma ama-athomu kudatha adlula amandla abophayo angaphezulu, ukuze ama-athomu amaningi noma ama-athomu adlulele noma ande, futhi awafake ngokuqondile ku-substrate ukuze enze ifilimu.I-ion sputtering coating isebenzisa ukunyakaza okuphezulu kwe-remonstrance yama-ion ephozithivu akhiqizwe ukuchithwa kwegesi ngaphansi komthelela wenkundla kagesi ukuze kuqhume ithagethi njenge-cathode, ukuze ama-athomu noma ama-molecule asendaweni eqondiwe abaleke futhi abeke phezu kwendawo yokusebenza epuletiwe ukuze akheke. ifilimu edingekayo.
Indlela evame ukusetshenziswa kakhulu ye-vacuum transpiration coating yindlela yokushisa yokumelana.Izinzuzo zayo ziyisakhiwo esilula somthombo wokushisa, izindleko eziphansi nokusebenza okulula.Ukungalungi kwayo ukuthi ayifanele izinsimbi eziphikisayo kanye nemidiya yokumelana nokushisa okuphezulu.Ukushisa kwe-electron beam kanye nokushisa kwe-laser kunganqoba ububi bokushisa kokumelana.Ekushisiseni kwe-electron beam, i-electron beam egxilile isetshenziselwa ukushisa ngokuqondile idatha egobolondo, futhi amandla e-kinetic we-electron beam aba amandla okushisa ukwenza ukudluliselwa kwedatha.Ukushisisa nge-laser kusebenzisa i-laser enamandla amakhulu njengomthombo wokushisisa, kodwa ngenxa yezindleko eziphezulu ze-laser enamandla amakhulu, kungasetshenziswa kuphela enanini elincane lamalabhorethri ocwaningo.
Ikhono lokuqhuqha lihlukile kukhono lokuphefumula nge-vacuum.I-Sputtering isho into eyenza izinhlayiya ezikhokhisiwe ziqhume zibuyele phezulu (impokophelo) yomzimba, ukuze ama-athomu aqinile noma ama-molecule akhishwe phezulu.Iningi lezinhlayiya ezikhishwayo ziyi-athomu, ngokuvamile ebizwa ngokuthi ama-athomu ahlakazekile.Izinhlayiya ezinama-sputtered ezisetshenziselwa ama-shelling targets kungaba ama-electron, ama-ion noma izinhlayiya ezingathathi hlangothi.Ngenxa yokuthi ama-ion alula ukuthola amandla e-kinetic adingekayo ngaphansi kwensimu kagesi, ama-ion akhethwa kakhulu njengezinhlayiya zokugoqa.
Inqubo yokufafaza isekelwe ekuphumeni okukhanyayo, okungukuthi, ama-ion okufafaza avela ekukhishweni kwegesi.Amakhono ahlukene wokuphalaza anezindlela ezihlukene zokukhipha ukukhanya.I-DC diode sputtering isebenzisa ukukhishwa kokukhanya kwe-DC;I-Triode sputtering wukuphuma okukhanyayo okusekelwa i-cathode eshisayo;I-RF sputtering isebenzisa ukukhishwa kokukhanya kwe-RF;I-Magnetron sputtering iwukukhipha okukhanyayo okulawulwa yi-annular magnetic field.
Uma kuqhathaniswa ne-vacuum transpiration coating, i-sputtering coating inezinzuzo eziningi.Uma noma iyiphi into ingafafazwa, ikakhulukazi izakhi nezinhlanganisela ezinephuzu eliphezulu lokuncibilika kanye nomfutho womoya ophansi;Ukunamathela phakathi kwefilimu ene-sputtered ne-substrate kuhle;Ukuminyana kwefilimu ephezulu;Ubukhulu befilimu bungalawulwa futhi ukuphindaphinda kuhle.Ububi ukuthi okokusebenza kuyinkimbinkimbi futhi kudinga amadivaysi anamandla kagesi.
Ngaphezu kwalokho, inhlanganisela yendlela yokuphefumula kanye nendlela ye-sputtering i-ion plating.Izinzuzo zale ndlela ukunamathela okuqinile phakathi kwefilimu ne-substrate, izinga eliphezulu lokubeka kanye nokuminyana okuphezulu kwefilimu.
Isikhathi sokuthumela: May-09-2022