Abasebenzisi abaningi kufanele ukuthi bezwile ngomkhiqizo wethagethi ye-sputtering, kodwa umgomo wokuchaphaza okuqondiwe kufanele ube ongajwayelekile.Manje, umhleli weI-Rich Special Material(RSM) yabelana ngezimiso zokuphalaza ze-magnetron zethagethi ye-sputtering.
Inkambu kazibuthe ye-orthogonal kanye nenkundla kagesi yengezwa phakathi kwe-electrode ehlosiwe (i-cathode) kanye ne-anode, igesi ye-inert edingekayo (ngokuvamile i-Ar gas) igcwaliswa egumbini le-vacuum ephezulu, umazibuthe ongunaphakade wenza insimu kazibuthe engu-250 ~ 350 Gauss on. ingaphezulu ledatha eqondisiwe, futhi inkambu ye-orthogonal electromagnetic yakhiwa ngenkambu kagesi ene-voltage ephezulu.
Ngaphansi komphumela wenkundla kagesi, i-Ar gas i-ionized ibe ama-ion nama-electron amahle.I-voltage ethile engalungile ephezulu yengezwa kulokho okuhlosiwe.Umthelela wendawo kazibuthe kuma-electron akhishwa esigxotsheni esiqondiwe kanye namathuba e-ionization okwanda kwegesi esebenzayo, okwakha i-plasma ephezulu kakhulu eduze kwe-cathode.Ngaphansi komphumela wamandla e-Lorentz, ama-Ar ions asheshisa endaweni okuqondiwe futhi aqhume indawo okuqondiwe kuyo ngesivinini esikhulu kakhulu, Ama-athomu ahlakazekile kokuphokophelwe alandela umgomo wokuguqula umfutho futhi andizele esuka endaweni okuhlosiwe aye endaweni engaphansi enamandla amakhulu e-kinetic. ukufaka amafilimu.
I-Magnetron sputtering ngokuvamile ihlukaniswe yaba izinhlobo ezimbili: i-Tributary sputtering kanye ne-RF sputtering.Umgomo wemishini yokuphalaza ilula, futhi izinga layo liyashesha uma uphafaza insimbi.I-RF sputtering isetshenziswa kabanzi.Ngokungeziwe ekufakeni izinto zokuhambisa, ingaphinda ifake izinto ezingezona ezi-conductive.Ngasikhathi sinye, iphinde iqhube i-sputtering esebenzayo ukulungisa izinto ze-oxides, nitrides, carbides nezinye izinhlanganisela.Uma i-RF frequency inyuswa, izoba i-microwave sputtering.Manje, i-electron cyclotron resonance (ECR) i-microwave sputtering ye-plasma ivame ukusetshenziswa.
Isikhathi sokuthumela: May-31-2022