Ngokukhula kwesidingo semakethe, izinhlobo eziningi kakhulu zokuhloswe kwe-sputtering zivuselelwa njalo.Ezinye zijwayelekile kanti ezinye azijwayelekile kumakhasimende.Manje, singathanda ukwabelana nawe ukuthi yiziphi izinhlobo zokuhloswe kwe-magnetron sputtering.
Ithagethi ye-sputtering inezinhlobo ezilandelayo: ithagethi ye-metal sputtering coating, ithagethi ye-alloy sputtering coating, ithagethi ye-ceramic sputtering, ithagethi ye-boride ceramic sputtering, ithagethi ye-carbide ceramic sputtering, ithagethi ye-fluoride ceramic sputtering, ithagethi ye-nitride ceramic sputtering, ithagethi ye-oxide ceramic puttering, ithagethi ye-selenide ceramics , ithagethi ye-silicide ceramic sputtering, ithagethi ye-sulfide ceramic sputtering, target ye-teluride ceramic sputtering, okunye okuhlosiwe kobumba, i-Chromium doped silicon oxide ceramic target (CR SiO), i-indium phosphide target (INP), i-lead arsenide target (pbas), i-indium arsenide target (InAs ).
I-Magnetron sputtering ngokuvamile ihlukaniswe yaba izinhlobo ezimbili: i-DC sputtering kanye ne-RF sputtering.Umgomo we-DC sputtering equipment ulula, futhi izinga lawo liyashesha uma uphafaza insimbi.I-RF sputtering isetshenziswa kabanzi.Ngokungeziwe ekufakeni idatha ye-conductive, ingaphinda ikhiphe idatha engaqhubeki.Ngasikhathi sinye, i-sputtering target iphinde ifake i-sputtering esebenzayo ukuze kulungiswe idatha ehlanganisiwe njengama-oxides, ama-nitrides nama-carbides.Uma i-RF frequency inyuka, izoba i-microwave sputtering.Njengamanje, i-electron cyclotron resonance (ECR) i-microwave sputtering ye-plasma isetshenziswa kakhulu.
Isikhathi sokuthumela: May-18-2022