Manje abasebenzisi abaningi ngokwengeziwe baqonda izinhlobo zokuhlosiwe kanyeizicelo zayo, kodwa ukuhlukaniswa kwayo kungase kungacaci kahle.Manje akeUnjiniyela we-RSM ukwabelana naweukungeniswa okuthile yezinhloso zokuqhumisa i-magnetron.
Ithagethi ye-sputtering: ithagethi ye-metal sputtering coating, ithagethi ye-alloy sputtering coating, ithagethi ye-ceramic sputtering, ithagethi ye-boride ceramic sputtering, ithagethi ye-carbide ceramic sputtering, ithagethi ye-fluoride ceramic sputtering, ithagethi ye-nitride ceramic sputtering, ithagethi ye-oxide ceramic, ithagethi ye-selenide ceramic sputtering ye-ceramic sputtering target, sulfide ceramic sputtering target, telluride ceramic sputtering target, ezinye izithagethi ze-ceramic, ithagethi ye-Chromium doped silicon oxide ceramic (CR SiO), i-indium phosphide target (INP), i-lead arsenide target (pbas), i-indium arsenide target (InAs).
I-Magnetron sputtering ngokuvamile ihlukaniswe yaba izinhlobo ezimbili: i-DC sputtering kanye ne-RF sputtering.Umgomo we-DC sputtering equipment ulula, futhi izinga lawo liyashesha uma uphafaza insimbi.I-RF sputtering isetshenziswa kabanzi.Ngokungeziwe ekufakeni idatha ye-conductive, ingaphinda ikhiphe idatha engaqhubeki.Ithagethi ye-sputtering ingase isetshenziselwe ukufafaza okusebenzayo ukuze kulungiswe idatha ehlanganisiwe njengama-oxides, ama-nitrides nama-carbides.Uma i-RF frequency inyuka, izoba i-microwave sputtering.Njengamanje, i-electron cyclotron resonance (ECR) i-microwave sputtering ye-plasma isetshenziswa kakhulu.
Isikhathi sokuthumela: May-26-2022