I-Magnetron sputtering coating iyindlela entsha yokwemboza umhwamuko, uma iqhathaniswa nendlela yangaphambili yokuhwamuka, izinzuzo zayo ezicini eziningi ziphawuleka kakhulu.Njengobuchwepheshe obuvuthiwe, i-magnetron sputtering isetshenziswe emikhakheni eminingi.
Isimiso se-Magnetron sputtering:
Inkambu kazibuthe ye-orthogonal kanye nenkundla kagesi yengezwa phakathi kwesigxobo sethagethi esputtered (i-cathode) kanye ne-anode, futhi igesi ye-inert edingekayo (imvamisa i-Ar gas) igcwaliswa ku-vacuum chamber ephezulu.Umazibuthe unomphela wenza inkambu kazibuthe engu-250-350 gaus ebusweni bento eqondiwe, futhi inkambu ye-orthogonal electromagnetic yakhiwa nenkundla kagesi yamandla aphezulu.Ngaphansi komphumela wendawo kagesi, i-ionization yegesi ye-Ar ibe ama-ion nama-electron, iqondise futhi inokucindezela okuthile okungekuhle, kusukela ekuhlosweni okusuka esigxotsheni ngomthelela wenkundla kazibuthe kanye nokukhuphuka kwamathuba e-ionization yegesi esebenzayo, yakha i-plasma ephezulu yokuminyana eduze i-cathode, i-Ar ion ngaphansi kwesenzo se-lorentz force, ijubane ukuze indizele endaweni okuqondiswe kuyo, indawo eqondiwe ngebhomu ngesivinini esikhulu, Ama-athomu ahlakazekile kokuphokophelwe alandela isimiso sokuguqulwa komfutho futhi andize asuke endaweni okuqondiwe kuyo nge-kinetic ephezulu. amandla kufilimu yokubeka i-substrate.
I-Magnetron sputtering ngokuvamile ihlukaniswe ngezinhlobo ezimbili: i-DC sputtering kanye ne-RF sputtering.Umgomo we-DC sputtering equipment ulula, futhi izinga liyashesha lapho uphafaza insimbi.Ukusetshenziswa kwe-RF sputtering kubanzi kakhulu, ngaphezu kwezinto ezihambisayo ezifafazayo, kodwa futhi nokuphafaza izinto ezingezona u-conductive, kodwa futhi nokulungiselela ukuphalaza okusebenzayo kwama-oxides, ama-nitrides nama-carbides nezinye izinto eziyinhlanganisela.Uma imvamisa ye-RF inyuka, iba yi-microwave sputtering.Njengamanje, i-electron cyclotron resonance (ECR) uhlobo lwe-microwave sputtering lusetshenziswa kakhulu.
Izinto eziqondiswe ku-Magnetron sputtering coating:
Izinto ezihlosiwe ze-Metal sputtering, okokunamathelisa okuyingxubevange, okokufaka okobumba, okokusebenza okuqondiwe kwe-boride ceramic sputtering, impahla eqondiwe ye-carbide ceramic sputtering, impahla eqondiwe ye-fluoride ceramic sputtering, izinto ezihlosiwe ze-nitride ceramic sputtering, ithagethi ye-oxide ceramic, i-selenide Ceramic sputtering. izinto eziqondiwe ze-silicid ceramic sputtering, sulfide ceramic sputtering target, Telluride ceramic sputtering target, enye ithagethi yobumba, ithagethi ye-chromium-doped silicon oxide ceramic (CR-SiO), indium phosphide target (InP), lead arsenide target (PbAs), indium arsenide target (InAs).
Isikhathi sokuthumela: Aug-03-2022