I-Wholesale AlNi Alloy Sputtering Target High Purity Thin Film PVD Coating Umkhiqizi Nomphakeli Owenziwe Ngokwezifiso |Ucebile

I-Aluminium Nickel

I-AlNi Alloy Sputtering Target High Purity High Thin Film PVD Coating Custom Made Featured Image

Incazelo emfushane:

Isigaba	I-Alloy Sputtering Target
I-Chemical Formula	AlNi
Ukwakheka	I-Aluminium Nickel
Ubumsulwa	99.9%, 99.95%, 99.99%
Isimo	Amapuleti, Okuqondiwe Kwekholomu, ama-arc cathodes, enziwe ngokwezifiso
Inqubo Yokukhiqiza	Ukuncibilika kweVacuum, PM
Usayizi Otholakalayo	L≤200mm, W≤200mm

Thumela i-imeyili kithi

Imininingwane Yomkhiqizo

Omaka bomkhiqizo

Ithagethi ye-Aluminium Nickel alloy sputtering ikhiqizwa ngendlela yokuncibilika kwe-vacuum kanye nokusansimbi kwamandla.Ukuhlanganisa i-Aluminium neNickel ngenani elidingekayo ukuze unikeze ingot yokusakaza ye-AlNi.I-ingot yokulingisa ibe isisikwa ukuze kwakheke umumo ofunekayo wethagethi.Inokuqina okuphezulu, usayizi wokusanhlamvu ocolisisiwe kanye nesakhiwo se-homogeneous microstructure, ngaphandle kokufutha kwegesi noma ama-pores.

Ngenxa yokuhlanganiswa kwayo okuhle kwezinto zokumboza kanye ne-substrate, ukufakwa kwe-AlNi kusebenza kahle ngaphansi kuka-700 ℃.Manje i-AlNi sputtering target isetshenziswa kakhulu ekugqokeni okungagqoki, okuhlanganisa amathuluzi okusika, isikhunta, izimboni zezimoto nezokwakha.

I-Rich Special Materials ingumkhiqizi we-Sputtering Target futhi ingakhiqiza izisetshenziswa ze-Aluminium Nickel Sputtering ngokuya ngokucaciswa kweKhasimende.Ukuze uthole ulwazi olwengeziwe, sicela usithinte.

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