I-Tungsten Silicide

I-Tungsten silicide WSi2 isetshenziswa njengento yokushaqeka kagesi kuma-microelectronics, ivala izintambo ze-polysilicon, i-anti-oxidation coating kanye ne-resistance wire coating.I-Tungsten silicide isetshenziswa njengento yokuxhumana kuma-microelectronics, ene-resistivity engu-60-80μΩcm.Yakheka ku-1000°C.Ngokuvamile isetshenziswa njenge-shunt yemigqa ye-polysilicon ukuze kwandiswe ukuqhutshwa kwayo nokwandisa isivinini sesignali.Isendlalelo se-tungsten Silicide singalungiswa ngokufakwa komhwamuko wamakhemikhali, njengokubeka umhwamuko.Sebenzisa i-monosilane noma i-dichlorosilane ne-tungsten hexafluoride njengegesi yezinto ezingavuthiwe.Ifilimu efakwe idiphozithi ayiyona i-stoichiometric futhi idinga ukuthi i-anneal iguqulwe ibe yifomu le-stoichiometric elisebenza kakhulu.

I-Tungsten silicide ingathatha indawo yefilimu ye-tungsten yangaphambili.I-Tungsten silicide nayo isetshenziswa njengesendlalelo sokuvimbela phakathi kwe-silicon nezinye izinsimbi.

I-Tungsten silicide nayo iyigugu kakhulu ezinhlelweni ze-microelectromechanical, phakathi kwazo i-tungsten silicide esetshenziswa kakhulu njengefilimu elincanyana lokukhiqiza ama-microcircuits.Ngale njongo, ifilimu ye-tungsten silicide ingaba yi-plasma-etched isebenzisa, isibonelo, i-silicide.

I-Rich Special Materials igxile Ekwenziweni Kwethagethi Ye-Sputtering futhi ingakhiqiza Izinto Zokuqhumisa I-Silicide ye-Tungsten ngokuvumelana nokucaciswa kwamakhasimende.Ukuze uthole ulwazi olwengeziwe, sicela usithinte.